Sugiki, Takanori;Inaki, Yoshiaki published 《Synthesis and lithographic characterization of poly(6-vinyluracil) derivative》 in 2001. The article was appeared in 《Journal of Photopolymer Science and Technology》. They have made some progress in their research.SDS of cas: 18592-13-7 The article mentions the following:
Enol ether derivative of poly(6-vinyluracil) was synthesized. The polymer released completely the tert-Bu groups above 190°C and gave poly(6-vinyluracil) which was stable up to 350°C. The resist film as spin coated from chloroform solution containing photo-acid generator released completely the tert-Bu groups after UV light irradiation followed by post exposure baking. Solubility of the obtained polymer containing uracil unit was significantly different from the original polymer containing alkoxy units in both polar (TMAH aqueous) and nonpolar (anisole) solvents as developer. The resist film was found to have high sensitivity and high contrast as both pos. and neg. type deep-UV resist materials. To complete the study, the researchers used 6-(Chloromethyl)pyrimidine-2,4(1H,3H)-dione (cas: 18592-13-7) .
6-(Chloromethyl)pyrimidine-2,4(1H,3H)-dione (cas: 18592-13-7 SDS of cas: 18592-13-7) was used in the synthesis of: 5-bromo-6-(chloromethyl)uracil, pteridine compounds, potential anticancer agents, substituted uracil pyridinium compounds, potential inhibitors of thymidine phosphorylase.
Reference:
Pyrimidine | C4H4N2 – PubChem,
Pyrimidine – Wikipedia